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The effect of substrate temperature on the structure and hardness of magnetron sputter deposited carbon nitride films

Journal Article · Wed Mar 31 23:00:00 EST 1999 · Physica Status Solidi A: Applied Research

DOI:https://doi.org/10.1002/(SICI)1521-396X(199904)172:2<373::AID-PSSA373>3.3.CO;2-C· OSTI ID:800352

Zheng, W T ^[1]; Guo, J H; Sjostrom, H; Sundgren, J E

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Research Organization:: Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (US)

Sponsoring Organization:: US Department of Energy (US)

DOE Contract Number:: AC03-76SF00098

OSTI ID:: 800352

Report Number(s):: LBNL/ALS--29612

Journal Information:: Physica Status Solidi A: Applied Research, Journal Name: Physica Status Solidi A: Applied Research Journal Issue: 2 Vol. 172

Country of Publication:: United States

Language:: English

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Related Subjects

43 PARTICLE ACCELERATORS
ADVANCED LIGHT SOURCE
ADVANCED LIGHT SOURCE ALS
CARBON NITRIDES
HARDNESS
MAGNETRONS
SUBSTRATES