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Effect of Temperature on Ti and TiN Films Deposited on BN Substrate

Journal Article · Fri Oct 24 00:00:00 EDT 1997 · Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films

OSTI ID:800647

Seal, S ^[1]; Underwood, J H; Uda, M; Osawa, H; Kanai, A; Barr, T L; Benko, E; Krauss, A; Perera, R C.C.

LBNL Library

No abstract prepared.

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Research Organization:: Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (US)

Sponsoring Organization:: USDOE Director, Office of Energy Research; Polish-American Sklodowska-Curie Joint Fund II, in cooperation with the Polish Ministry of Industry and NIST (US)

DOE Contract Number:: AC03-76SF00098

OSTI ID:: 800647

Report Number(s):: LBNL--41065; LBNL/ALS--914

Journal Information:: Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, Journal Name: Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films Journal Issue: 3 Vol. 16

Country of Publication:: United States

Language:: English

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Related Subjects

43 PARTICLE ACCELERATORS
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ADVANCED LIGHT SOURCE
ADVANCED LIGHT SOURCE ALS
FILMS
SUBSTRATES