Effect of temperature on Ti and TiN films deposited on a BN substrate

Journal Article · Fri May 01 00:00:00 EDT 1998 · Journal of Vacuum Science and Technology, A

DOI:https://doi.org/10.1116/1.581125· OSTI ID:342645

Seal, S ^[1]; Underwood, H ^[2]; Uda, M; Osawa, H; Kanai, A ^[3]; Barr, T L ^[4]; Benko, E ^[5]; Krauss, A ^[6]; Perera, R C ^[7]

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1. Advanced Light Source, Lawrence Berkeley Laboratory, University of California--Berkeley, Berkeley, California 94720 (United States)
2. Center for X-ray Optics, Lawrence Berkeley Laboratory, University of California--Berkeley, Berkeley, California 94720 (United States)
3. Materials Science and Engineering, Waseda University, Tokyo (Japan)
4. Materials Department and Laboratory for Surface Studies, University of Wisconsin, Wisconsin 53201 (United States)
5. Institute of Cutting Tools, Cracow 30-011 (Poland)
6. Argonne National Laboratory, Chicago, Illinois 60439 (United States)
7. Center for X-ray Optics, Lawrence Berkeley National Laboratory, University of California--Berkeley, Berkeley, California 94720 (United States)

Nitrides (such as BN and TiN) are widely used in various industrial applications because of their excellent wear and corrosion resistance and their thermal and electronic properties. The structural and chemical features formed during plasma vapor deposition of Ti/TiN on BN substrates have been studied using synchrotron radiation near edge absorption spectroscopy (NEXAFS). Various phases of interest have been formed with different annealing temperatures. Diffusion of the nitridation and the interference from oxidation (e.g., TiO{sub 2}) and boride formation are of particular concern. X-ray photoelectron spectroscopy and secondary ion mass spectroscopy measurements complement our NEXAFS data. Phase formation and chemical bonding between the coating and the substrate are shown to be determining factors for the microhardness. {copyright} {ital 1998 American Vacuum Society.}

• OSTI ID: 342645
• Report Number(s): CONF-971029--
• Journal Information: Journal of Vacuum Science and Technology, A, Journal Name: Journal of Vacuum Science and Technology, A Journal Issue: 3 Vol. 16; ISSN JVTAD6; ISSN 0734-2101
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
66 PHYSICS
ABSORPTION SPECTRA
ANNEALING
BORON COMPOUNDS
BORON NITRIDES
CHEMICAL BONDS
MASS SPECTRA
MICROHARDNESS
OXIDATION
PHASE STUDIES
STRUCTURAL CHEMICAL ANALYSIS
SURFACE HARDENING
SYNCHROTRON RADIATION
THIN FILMS
TITANIUM
TITANIUM COMPOUNDS
TITANIUM NITRIDES
X-RAY SPECTROSCOPY