An X-ray photoelectron spectroscopic study of the B-N-Ti system
- Lawrence Berkeley National Lab., CA (United States)
- Univ. of Wisconsin, Milwaukee, WI (United States)
- Foundry Research Inst., Cracow (Poland)
- Inst. of Metal Cutting, Cracow (Poland)
- Polish Academy of Sciences, Cracow (Poland). Inst. of Metallurgy and Materials Science
Composite nitrides (such as BN, TiN) are widely used in various industrial applications because of their extreme wear and corrosion resistance, thermal and electrical properties. In order to obtain composite materials with these optimal properties, it is important to elucidate whether any chemical reactions occur at nitride/metal interfaces, e.g., those involving BN-Ti/TiN. Materials of interest include the deposition by PVD of Ti and TiN on BN substrates. Some of these systems were then subjected to varying degrees of physical and thermal alteration. Detailed X-ray photoelectron spectroscopy (XPS) has therefore been rendered of these interfaces using cross-sectional display and sputter etching. Resulting structural and morphological features have been investigated with transmission electron microscopy (TEM) and X-ray diffraction (XRD). Diffusion of the nitridation, oxynitride formation and interfacial growth are of general interest.
- Research Organization:
- Lawrence Berkeley National Lab., CA (United States)
- Sponsoring Organization:
- USDOE Office of Energy Research, Washington, DC (United States); National Inst. of Standards and Technology, Gaithersburg, MD (United States); Government of Poland, Warsaw (Poland)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 521611
- Report Number(s):
- LBNL--40396; LSBL--384; CONF-970302--19; ON: DE97007896
- Country of Publication:
- United States
- Language:
- English
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