Extreme ultraviolet interferometric measurements of diffraction-limited optics
Journal Article
·
· Journal of Vacuum Science and Technology B: Microelect. & Nanometer Structures
- LBNL Library
No abstract prepared.
- Research Organization:
- Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (US)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 800250
- Report Number(s):
- LBNL/ALS--1722
- Journal Information:
- Journal of Vacuum Science and Technology B: Microelect. & Nanometer Structures, Journal Name: Journal of Vacuum Science and Technology B: Microelect. & Nanometer Structures Journal Issue: 6 Vol. 17
- Country of Publication:
- United States
- Language:
- English
Similar Records
Extreme ultraviolet interferometric measurements of diffraction-limited optics
Interferometric at-wavelength flare characterization of extreme ultraviolet optical systems
Tolerancing of diffraction-limited Kirkpatrick-Baez synchrotron beamline optics for extreme-ultraviolet metrology
Journal Article
·
Sun Oct 31 23:00:00 EST 1999
· Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena
·
OSTI ID:20217899
Interferometric at-wavelength flare characterization of extreme ultraviolet optical systems
Journal Article
·
Sun Oct 31 23:00:00 EST 1999
· Journal of Vacuum Science and Technology B: Microelect. & Nanometer Structures
·
OSTI ID:800249
Tolerancing of diffraction-limited Kirkpatrick-Baez synchrotron beamline optics for extreme-ultraviolet metrology
Journal Article
·
Wed Jan 31 23:00:00 EST 2001
· Applied Optics
·
OSTI ID:789166