Extreme ultraviolet interferometric measurements of diffraction-limited optics

Journal Article · Sun Oct 31 23:00:00 EST 1999 · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena

DOI:https://doi.org/10.1116/1.590939· OSTI ID:20217899

Goldberg, Kenneth A ^[1]; Naulleau, Patrick ^[1]; Bokor, Jeffrey ^[1]

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1. Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States)

At-wavelength interferometric measurements of recently fabricated extreme ultraviolet (EUV) microstepper projection optics have revealed the highest performance for prototype EUV lithographic systems observed to date. The phase-shifting point diffraction interferometer is used to measure and align these two-mirror, multilayer-coated Schwarzschild optical systems designed with a numerical aperture of 0.088 and operating at 13.4 nm wavelength. Root-mean-square wave front error magnitudes as small as 0.60 nm have been achieved, actually exceeding the design tolerance set for these objectives. (c) 1999 American Vacuum Society.

• OSTI ID: 20217899
• Journal Information: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena, Journal Name: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena Journal Issue: 6 Vol. 17; ISSN 0734-211X; ISSN JVTBD9
• Country of Publication: United States
• Language: English

Related Subjects

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
APERTURES
DESIGN
DIFFRACTION
EXPERIMENTAL DATA
INTERFEROMETRY
OPTICAL SYSTEMS
ULTRAVIOLET RADIATION
WAVE FORMS