Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Phase-shifting point-diffraction interferometry at EUV wavelengths

Technical Report ·
DOI:https://doi.org/10.2172/603707· OSTI ID:603707
; ;  [1]
  1. Ernest Orlando Lawrence Berkeley National Lab., CA (United States); and others

A novel phase-shifting point-diffraction interferometer (PS/PDI) operating at the Advanced Light Source (ALS) is being used to perform wavefront-measuring metrology at 13.4-nm wavelength to characterize aberrations in a multilayer-coated 10x Schwarzschild objective designed for extreme ultraviolet (EUV) projection lithography experiments. To achieve 0.1-micron critical dimension pattern transfer with EUV projection lithography at 13.4-nm wavelength, nearly diffraction-limited all-reflective multilayer-coated optical systems with 0.1 numerical aperture are required. The EUV wavefront, determined by the mirror surfaces and the reflective multilayer coatings, is measurable only at the operational wavelength of the system. The authors goal is to measure the EUV wavefront to an accuracy of 0.01 waves rms (0.13 nm). The PS/PDI is a type of point-diffraction interferometer, modified for significantly improved throughput and phase-shifting capability. The interferometer design utilizes a grating beamsplitter and pinhole spatial filters in the object and image planes of the optical system under test. The 10x-reduction Schwarzschild objective, with image-side numerical aperture of 0.08, is illuminated by a sub-micron pinhole in the object plane. A coarse, 20-micron pitch grating placed between the illumination pinhole and the Schwarzschild system serves a dual role as a small-angle beam-splitter and a phase-shifting element. The first-order diffracted beam from the grating is spatially filtered in the image plane of the Schwarzschild with a sub-100-nm pinhole and becomes the `D reference` wave in the interferometer. The zero-order beam is the `test` wave, and it passes unobstructed through a 4.5-{mu}m window in the image plane. The test and reference beams are separated by several microns in the image plane to minimize beam overlap. The interference fringes are recorded with a CCD detector placed about 12 cm from the Schwarzschild image plane.

Research Organization:
Lawrence Berkeley Lab., CA (United States)
DOE Contract Number:
AC03-76SF00098
OSTI ID:
603707
Report Number(s):
LBNL--39981; ON: DE97007345
Country of Publication:
United States
Language:
English

Similar Records

At-wavelength interferometry of extreme ultraviolet lithographic optics
Journal Article · Sat Oct 31 23:00:00 EST 1998 · AIP Conference Proceedings · OSTI ID:678847

Extreme ultraviolet interferometry
Thesis/Dissertation · Sun Nov 30 23:00:00 EST 1997 · OSTI ID:658173

Dual-domain lateral shearing interferometer
Patent · Mon Mar 15 23:00:00 EST 2004 · OSTI ID:1174776