Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Interferometric at-wavelength flare characterization of extreme ultraviolet optical systems

Journal Article · · Journal of Vacuum Science and Technology B: Microelect. & Nanometer Structures
DOI:https://doi.org/10.1116/1.590940· OSTI ID:800249

No abstract prepared.

Research Organization:
Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (US)
Sponsoring Organization:
US Department of Energy (US)
DOE Contract Number:
AC03-76SF00098
OSTI ID:
800249
Report Number(s):
LBNL/ALS--1721
Journal Information:
Journal of Vacuum Science and Technology B: Microelect. & Nanometer Structures, Journal Name: Journal of Vacuum Science and Technology B: Microelect. & Nanometer Structures Journal Issue: 6 Vol. 17
Country of Publication:
United States
Language:
English

Similar Records

Atto-wavelength, system-level flare characterization of extreme-ultraviolet (EUV) optical systems
Journal Article · Fri Oct 29 00:00:00 EDT 1999 · Applied Optics · OSTI ID:767555

Interferometric at-wavelength flare characterization of extreme ultraviolet optical systems
Journal Article · Sun Oct 31 23:00:00 EST 1999 · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena · OSTI ID:20217900

Extreme ultraviolet interferometric measurements of diffraction-limited optics
Journal Article · Sun Oct 31 23:00:00 EST 1999 · Journal of Vacuum Science and Technology B: Microelect. & Nanometer Structures · OSTI ID:800250