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Atto-wavelength, system-level flare characterization of extreme-ultraviolet (EUV) optical systems

Journal Article · Fri Oct 29 00:00:00 EDT 1999 · Applied Optics

OSTI ID:767555

Naulleau, Patrick ^[1]; Goldberg, Kenneth; Gullikson, Eric M; Bokor, Jeffrey

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Research Organization:: Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (US)

Sponsoring Organization:: USDOE Director, Office of Science. Office of Basic Energy Studies (US)

DOE Contract Number:: AC03-76SF00098

OSTI ID:: 767555

Report Number(s):: LBNL--44480

Journal Information:: Applied Optics, Journal Name: Applied Optics Journal Issue: 17 Vol. 39; ISSN 0003-6935; ISSN APOPAI

Country of Publication:: United States

Language:: English

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Related Subjects

47 OTHER INSTRUMENTATION
EXTREME ULTRAVIOLET RADIATION
OPTICAL PROPERTIES
OPTICAL SYSTEMS
WAVELENGTHS