At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems
- Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Brekeley, California 94720 (United States)
The extreme-ultraviolet (EUV) phase-shifting point-diffraction interferometer (PS/PDI) has recently been developed to provide high-accuracy wave-front characterization critical to the development of EUV lithography systems. Here we describe an enhanced implementation of the PS/PDI that significantly extends its measurement bandwidth. The enhanced PS/PDI is capable of simultaneously characterizing both wave front and flare. PS/PDI-based flare characterization of two recently fabricated EUV 10x-reduction lithographic optical systems is presented. (c) 2000 Optical Society of America.
- OSTI ID:
- 20217161
- Journal Information:
- Applied Optics, Journal Name: Applied Optics Journal Issue: 17 Vol. 39; ISSN 0003-6935; ISSN APOPAI
- Country of Publication:
- United States
- Language:
- English
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