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The atomic arrangement at Cr/GaAs (110) interfaces

Journal Article · · Journal of Vacuum Science and Technology B
DOI:https://doi.org/10.1116/1.584794· OSTI ID:791219
As part of a project to explore the mechanism of Schottky barrier formation at a metal-semiconductor interface, high-resolution electron microscope images were simulated as an aid to interpretation of the contrast observed experimentally at Cr/GaAs(110) interfaces.
Research Organization:
Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (US)
Sponsoring Organization:
USDOE Director, Office of Science. Office of Basic Energy Studies. Division of Materials Sciences; Office of Naval Research N0014-86-K-0668 (US)
DOE Contract Number:
AC03-76SF00098
OSTI ID:
791219
Report Number(s):
LBNL--49295
Journal Information:
Journal of Vacuum Science and Technology B, Journal Name: Journal of Vacuum Science and Technology B Journal Issue: 4 Vol. 7
Country of Publication:
United States
Language:
English

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