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Deuterium depth profiles in metals using imaging field desorption

Journal Article · · J. Vac. Sci. Technol.; (United States)
DOI:https://doi.org/10.1116/1.569289· OSTI ID:7330797
Depth profiles of 80-eV deuterium ions implanted in situ into (110) tungsten have been measured by imaging, field-desorption mass spectrometry. The relative abundance of deuterium was measured from the surface to a depth of 300 A with 2-A depth resolution by controlled field evaporation of the specimen, and time-of-flight mass spectroscopy. The measured position of the depth-distribution maximum (49 +- 2 A from the surface), and structure in the distribution is consistent with a model which describes channeling of the deuterium in the near-surface region following recoil implantation of impurity species from the tungsten surface. The depth distribution of these implanted surface species has also been measured. For carbon and oxygen, penetration is limited to 22 A, with abundance decreasing exponentially from the surface. The maximum measured implantation depths of these species are in agreement with those predicted theoretically, assuming a model where surface carbon and oxygen are channeled into the near-surface region by the incoming deuterium. These results will be interpreted in the context of the CTR first-wall impurity problem, and will be used to suggest a novel method for in situ characterization of low-energy plasma species in operating CTR devices.
Research Organization:
Sandia Laboratories, Albuquerque, New Mexico 87115
OSTI ID:
7330797
Journal Information:
J. Vac. Sci. Technol.; (United States), Journal Name: J. Vac. Sci. Technol.; (United States) Vol. 14:1; ISSN JVSTA
Country of Publication:
United States
Language:
English