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Application of nuclear reactions for quantitative hydrogen analysis in a variety of different materials problems

Conference ·
OSTI ID:7303699

The application of nuclear reaction techniques to hydrogen analysis problems in metallurgical, mineralogical and semi-conductor areas are described. Hydrogen analyses and profiles obtained with both the /sup 1/H(/sup 19/F,..cap alpha gamma..)/sup 16/O and /sup 1/H(/sup 15/N,..cap alpha gamma..)/sup 12/C reactions are presented. The advantages and disadvantages of the two techniques are discussed. Both crystalline and amorphous materials are examined. Particular emphasis will be given to interpretative problems associated with analyzing the data. Various corrections to the data will be discussed, including off-resonance cross-section corrections and lower energy resonance corrections. The hydrogen content of electrodeposited hard gold films has been determined as a function of plating conditions. Hydrogen contents as high as 9 atom percent have been measured. The hydrogen profile of natural and synthetic SiO/sub 2/ samples was determined. Hydrogen was found to be quite stable in amorphous silica samples but highly mobile in crystalline quartz samples under the analysis conditions. A hydrogen depth profile for a film of glow and discharge deposited amorphous silicon (approximately 4500 A thick) has been obtained and will be compared with a profile measured by secondary ion mass spectrometry (SIMS) on the same sample.

Research Organization:
Oak Ridge National Lab., TN (USA); Bell Labs., Murray Hill, NJ (USA); RCA Labs., Princeton, NJ (USA)
DOE Contract Number:
W-7405-ENG-26
OSTI ID:
7303699
Report Number(s):
CONF-770642-3
Country of Publication:
United States
Language:
English