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Reordering of amorphous layers of Si implanted with /sup 31/P, /sup 75/As, and /sup 11/B ions

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.323408· OSTI ID:7289836
The effect of impurities on the epitaxial regrowth of Si from amorphous layers created by ion implantation into <100> and <111> Si was studied by channeling effect measurements with 2-MeV /sup 4/He ions. The Si wafers were first implanted at -180 /sup 0/C with /sup 28/Si ions to form amorphous layers approximately 4000 A thick and then were implanted with /sup 31/P, /sup 75/As, or /sup 11/B ions to concentration levels of about 0.2--0.5 at.%. For these layers with impurity species the growth rate is found to be significantly higher than for those without. The measured regrowth rate at 500 /sup 0/C for <100> Si with an impurity concentration of approx.2 x 10/sup 20/ cm/sup -3/ of /sup 31/P or /sup 75/As is a factor of 6 greater, and of /sup 11/B a factor of 20 greater, than the regrowth rate in amorphous layers without impurities. For the case of /sup 31/P implanted <100> Si the activation energy of regrowth is close to that (2.35 eV) found for impurity-free amorphous layers and for /sup 11/B implanted samples the energy is 1.9 eV. For <111> /sup 31/P implanted Si specimens there is an increase in growth rate over that found in impurity-free samples and a high level of residual disorder.
Research Organization:
California Institute of Technology, Pasadena, California 91125
OSTI ID:
7289836
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 48:10; ISSN JAPIA
Country of Publication:
United States
Language:
English