Ga/sub( 1-x)/Al/sub x/As/Ga/sub( 1-y)/Al/sub y/As double-heterostructure room-temperature lasers grown by metalorganic chemical vapor deposition
Journal Article
·
· Appl. Phys. Lett.; (United States)
Room-temperature operation of Ga/sub( 1-x)/Al/sub x/As/Ga/sub( 1-y)/Al/sub y/As double-heterostructure lasers grown by metalorganic chemical vapor deposition (MO-CVD) has been achieved. These devices have Ga/sub( 1-y)/Al/sub y/As active layers of 0.89 or approx. =y9 or approx. =0.12 and emit in the wavelength range 8000
- Research Organization:
- Rockwell International, Electronic Device Division, Electronic Research Center, Anaheim, California 92803
- OSTI ID:
- 7282749
- Journal Information:
- Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 31:12; ISSN APPLA
- Country of Publication:
- United States
- Language:
- English
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Very low threshold Ga/sub() 1-x/Al/sub x/As-GaAs double-heterostructure lasers grown by metalorganic chemical vapor deposition
Journal Article
·
Sat Oct 01 00:00:00 EDT 1977
· Appl. Phys. Lett.; (United States)
·
OSTI ID:7220845
Infrared-visible (0. 89--0. 72. mu. m) Al/sub x/Ga/sub 1-x/As/Al/sub y/Ga/sub 1-y/As double-heterostructure lasers grown by molecular beam epitaxy
Journal Article
·
Thu Jan 31 23:00:00 EST 1980
· J. Appl. Phys.; (United States)
·
OSTI ID:5507297
Very low threshold Ga/sub() 1-x/Al/sub x/As-GaAs double-heterostructure lasers grown by metalorganic chemical vapor deposition
Journal Article
·
Fri Apr 14 23:00:00 EST 1978
· Appl. Phys. Lett.; (United States)
·
OSTI ID:5091889
Related Subjects
42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
ALUMINIUM ARSENIDES
ALUMINIUM COMPOUNDS
ARSENIC COMPOUNDS
ARSENIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
DEPOSITION
ENERGY
EPITAXY
FABRICATION
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
LASERS
LAYERS
PNICTIDES
SEMICONDUCTOR DEVICES
SEMICONDUCTOR LASERS
SURFACE COATING
THRESHOLD ENERGY
420300* -- Engineering-- Lasers-- (-1989)
ALUMINIUM ARSENIDES
ALUMINIUM COMPOUNDS
ARSENIC COMPOUNDS
ARSENIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
DEPOSITION
ENERGY
EPITAXY
FABRICATION
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
LASERS
LAYERS
PNICTIDES
SEMICONDUCTOR DEVICES
SEMICONDUCTOR LASERS
SURFACE COATING
THRESHOLD ENERGY