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Di- and tri-carboxylic-acid-based etches for processing high temperature superconducting thin films and related materials

Journal Article · · Journal of Materials Research; (United States)
;  [1]; ; ; ;  [2]; ;  [3]
  1. National Renewable Energy Laboratory, 1617 Cole Boulevard, Golden, Colorado 80401 (United States)
  2. Sandia National Laboratories, Albuquerque, New Mexico 87185-5800 (United States)
  3. Conductus, Sunnyvale, California 94086 (United States)
The development of passive and active electronics from high-temperature superconducting thin films depends on the development of process technology capable of producing appropriate feature sizes without degrading the key superconducting properties. We present a new class of chelating etches based on di- and tri-carboxylic acids that are compatible with positive photoresists and can produce sub-micron feature sizes while typically producing increases the microwave surface resistance at 94 GHz by less than 10%. This simple etching process works well for both the Y--Ba--Cu--O and Tl--Ba--Ca--Cu--O systems. In addition, we demonstrate that the use of chelating etches with an activator such as HF allows the etching of related oxides such as LaAlO[sub 3], which is a key substrate material, and Pb(Zr[sub 0.53]Ti[sub 0.47])O[sub 3] (PZT) which is a key ferroelectric material for HTS and other applications such as nonvolatile memories.
OSTI ID:
7279913
Journal Information:
Journal of Materials Research; (United States), Journal Name: Journal of Materials Research; (United States) Vol. 9:5; ISSN JMREEE; ISSN 0884-2914
Country of Publication:
United States
Language:
English