Di- and Tricarboxylic-acid-based etches for processing high temperature superconducting thin films

Journal Article · Mon Oct 25 04:00:00 EDT 1993 · Applied Physics Letters; (United States)

DOI:https://doi.org/10.1063/1.110497· OSTI ID:6082474

Ginley, D S ^[1]; Ashby, C I.H.; Plut, T A; Urea, D; Siegal, M P ^[2]; Martens, J S ^[3]

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1. National Renewable Energy Laboratory, 1617 Cole Blvd. Golden, Colorado 80401 (United States)
2. Sandia National Laboratories, Albuquerque, New Mexico 87185-58 (United States)
3. Conductus, Sunnyvale, California 94086 (United States)

The development of passive and active electronics from high temperature superconducting thin films depends on the development of process technology capable of producing appropriate feature sizes without degrading the key superconducting properties. We present a new class of chelating etches based on di- and tricarboxylic acids that are compatible with positive photoresists and can produce submicrometer feature sizes while typically producing increases the microwave surface resistance at 94 GHz by less than 10%. This simple etching process works well for both the Y-Ba-Cu-O and Tl-Ba-Ca-Cu-O systems.

• OSTI ID: 6082474
• Journal Information: Applied Physics Letters; (United States), Journal Name: Applied Physics Letters; (United States) Vol. 63:17; ISSN 0003-6951; ISSN APPLAB
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360201 -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360205* -- Ceramics
Cermets
& Refractories-- Corrosion & Erosion
CARBOXYLIC ACIDS
ETCHING
FILMS
HIGH-TC SUPERCONDUCTORS
MICROWAVE SPECTRA
ORGANIC ACIDS
ORGANIC COMPOUNDS
SPECTRA
SUPERCONDUCTING DEVICES
SUPERCONDUCTING FILMS
SUPERCONDUCTORS
SURFACE FINISHING
SURFACE TREATMENTS