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Title: Superconducting microcircuitry by the microlithographic patterning of superconducting compounds and related materials

Patent ·
OSTI ID:6273988

A method is described of producing superconducting microcircuits comprising the steps of: depositing a thin film of Ba[sub 2]Cu[sub 3]O[sub 5+x](O < x < 1) onto a substrate; depositing a thin film of a dopant onto said thin film of Ba[sub 2]Cu[sub 3]O[sub 5+x]; depositing a photoresist onto said thin film of a dopant; shining light through a mask containing a pattern for a desired circuit configuration and onto said photoresist; developing said photoresist to remove portions of said photoresist shined by the light and to selectively expose said dopant film; etching said selectively exposed dopant film from said thin film of Ba[sub 2]Cu[sub 3]O[sub 5+x] to form a pattern of dopant; and heating said substrate at a temperature and for a period of time sufficient to diffuse and react said pattern of dopant with said thin film of Ba[sub 2]Cu[sub 3]O[sub 5+x].

DOE Contract Number:
W-7405-ENG-36
Assignee:
Dept. of Energy, Washington, DC (United States)
Patent Number(s):
US 5238913; A
Application Number:
PPN: US 7-860337
OSTI ID:
6273988
Resource Relation:
Patent File Date: 30 Mar 1992
Country of Publication:
United States
Language:
English