Superconducting microcircuitry by the microlithgraphic patterning of superconducting compounds and related materials

Patent · Fri Jan 01 00:00:00 EST 1993

OSTI ID:868896

Coppa, Nicholas V ^[1]

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1. Los Alamos, NM

Superconducting microcircuits including a thin layer of Ba.sub.2 Cu.sub.3 O.sub.5+x (0<1) on a substrate. A thin layer of a dopant; for example, Y.sub.2 O.sub.3 for superconducting patterns of YBa.sub.2 Cu.sub.3 O.sub.7-x, or Pr.sub.2 O.sub.3 for insulator patterns of PrBa.sub.2 Cu.sub.3 O.sub.7-x. These layers are covered with a layer of photoresist, which is exposed to light through a mask having a pattern for a desired circuit. The photoresist is then developed to reveal a pattern of the thin dopant layer which will be etched away. The microcircuit is then etched and stripped to remove the unneeded portion of the thin dopant layer. Finally, the microcircuit is heated at a temperature and for a period of time sufficient to diffuse and react the dopant layer with the thin layer of Ba.sub.2 Cu.sub.3 O.sub.5+x, forming a pattern of superconductor or insulator.

• Research Organization: Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
• DOE Contract Number: W-7405-ENG-36
• Assignee: United States of America as represented by United States (Washington, DC)
• Patent Number(s): US 5238913
• OSTI ID: 868896
• Country of Publication: United States
• Language: English

Related Subjects

superconducting
microcircuitry
microlithgraphic
patterning
compounds
related
materials
microcircuits
including
layer
cu
substrate
dopant
example
patterns
yba
7-x
insulator
prba
layers
covered
photoresist
exposed
light
mask
pattern
desired
circuit
developed
reveal
etched
microcircuit
stripped
remove
unneeded
portion
finally
heated
temperature
period
time
sufficient
diffuse
react
forming
superconductor
related materials
time sufficient
circuits including
superconducting compounds
desired circuit
/505/204/216/