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Electrophoretic deposition of textured YBa sub 2 Cu sub 3 O sub 7 minus x films on silver substrates

Journal Article · · Journal of Applied Physics; (USA)
DOI:https://doi.org/10.1063/1.343620· OSTI ID:7268753
; ; ;  [1]; ; ;  [2]
  1. Fachbereich Physik, Bergische Universitaet Wuppertal, D-5600 Wuppertal 1, West Germany (DE)
  2. Interatom GmbH, D-5060 Bergisch-Gladbach 1, West Germany (DE)

We have deposited 10--20-{mu}m-thick YBa{sub 2}Cu{sub 3}O{sub 7{minus}{ital x}} films by an electrophoretic process on silver substrates in a magnetic field of 8 T. X-ray diffraction patterns of these 2.4-cm-diameter samples show a high degree of {ital c}-axis texturing perpendicular to the surface. Their microwave surface resistance {ital R}{sub {ital s}} was measured at 21.5 GHz in the temperature range from 4.2 to 300 K. It was found to drop sharply at 92.4 K to reach 18{plus minus}3 m{Omega} at 77 K and less than 3 m{Omega} at 4.2 K. These first results exceed the values obtained from bulk samples and untextured thick films, and are lower than {ital R}{sub {ital s}} of pure copper at the same frequency and temperature. The electrophoretic deposition technique is applicable to large substrates of nonplanar geometry and is therefore suitable for applications of high-{ital T}{sub {ital c}} superconductors in the field of microwave technology.

OSTI ID:
7268753
Journal Information:
Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 66:12; ISSN 0021-8979; ISSN JAPIA
Country of Publication:
United States
Language:
English

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