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Superconducting thin films of Y-Ba-Cu-O prepared by metalorganic chemical vapor deposition

Journal Article · · Journal of Applied Physics; (USA)
DOI:https://doi.org/10.1063/1.345666· OSTI ID:7203377
; ; ;  [1]; ;  [2]
  1. School of Electrical Engineering and Computer Science, University of Oklahoma, Norman, Oklahoma 73019 (USA)
  2. Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695-7916 (USA)

High throughput, low-temperature deposition, sharp interfaces, and selective deposition with direct ion-, electron-, and photon-beam-controlled techniques are some of the key driving forces for the development of superconducting thin films by metalorganic chemical vapor deposition (MOCVD) technique. In this paper we report on the electrical and structural properties of Y-Ba-Cu-O (YBCO) films deposited by MOCVD on yttrium-stabilized zirconia (YSZ) and BaF{sub 2}/YSZ substrates using a single-step {ital in} {ital situ} processing method which requires no further annealing. YBCO films deposited on BaF{sub 2}/YSZ substrates have zero resistance at 80 K. The films were characterized by energy dispersive x-ray analysis, x-ray diffraction, scanning electron microscopy, and transmission electron microscopy. The films on BaF{sub 2}/YSZ substrates exhibited textured growth having both the {ital c} and {ital a} axis perpendicular to the substrate. The use of BaF{sub 2} as a buffer layer suggests three-dimensional integration of high-temperature superconducting thin film for hybrid superconductor/semiconductor devices as well as superconductor switches and other related devices.

OSTI ID:
7203377
Journal Information:
Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 67:3; ISSN 0021-8979; ISSN JAPIA
Country of Publication:
United States
Language:
English

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