Reduced thermal budget processing of Y-Ba-Cu-O films by rapid isothermal processing assisted metalorganic chemical vapor deposition
- School of Electrical Engineering and Computer Science, University of Oklahoma, Norman, Oklahoma 73019 (US)
- Materials Science and Engineering Department, North Carolina State University, Raleigh, North Carolina 27695-7916 (USA)
Metalorganic chemical vapor deposition (MOCVD) has the potential of emerging as a viable technique to fabricate ribbons, tapes, coated wires, and the deposition of films of high-temperature superconductors, and related materials. As a reduced thermal budget processing technique, rapid isothermal processing (RIP) based on incoherent radiation as the source of energy can be usefully coupled to conventional MOCVD. In this paper we report on the deposition and characterization of high quality superconducting thin films of Y-Ba-Cu-O (YBCO) on yttrium stabilized zirconia substrates by RIP assisted MOCVD. Using O{sub 2} gas as the source of oxygen, YBCO films deposited initially at 600 {degree}C for 1 min and at 745 {degree}C for 25 min followed by deposition at 780 {degree}C for 45 s are primarily {ital c}-axis oriented and zero resistance is observed at 89--90 K. The zero magnetic field current density at 53 and 77 K are 1.2{times}10{sup 6} and 3{times}10{sup 5} A/cm{sup 2}, respectively. By using a mixture of N{sub 2}O and O{sub 2} as the oxygen source substrate temperature was further reduced in the deposition of YBCO films. The films deposited initially at 600 {degree}C for 1 min and than at 720 {degree}C for 30 min are {ital c}-axis oriented and with zero resistance being observed at 91 K. The zero magnetic field current densities at 53 and 77 K are 3.4{times}10{sup 6} and 1.2{times}10{sup 6} A/cm{sup 2}, respectively. To the best of our knowledge this is the highest value of critical current density, {ital J}{sub {ital c}} for films deposited by MOCVD at a substrate temperature as low as 720 {degree}C. It is envisioned that high energy photons from the incoherent light source and the use of a mixture of N{sub 2}O and O{sub 2} as the oxygen source, assist chemical reactions and lower overall thermal budget for processing of these films.
- OSTI ID:
- 5736058
- Journal Information:
- Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 69:4; ISSN 0021-8979; ISSN JAPIA
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
ALKALINE EARTH METAL COMPOUNDS
BARIUM COMPOUNDS
BARIUM OXIDES
CHALCOGENIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
COPPER COMPOUNDS
COPPER OXIDES
CRITICAL CURRENT
CURRENTS
DEPOSITION
ELECTRIC CURRENTS
FILMS
HEAT TREATMENTS
HIGH TEMPERATURE
HIGH-TC SUPERCONDUCTORS
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
SUPERCONDUCTING FILMS
SUPERCONDUCTORS
SURFACE COATING
THERMODYNAMIC PROPERTIES
TRANSITION ELEMENT COMPOUNDS
TRANSITION TEMPERATURE
VERY HIGH TEMPERATURE
YTTRIUM COMPOUNDS
YTTRIUM OXIDES