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Reduced thermal budget processing of Y--Ba--Cu--O high temperature superconducting thin films by metalorganic chemical vapor deposition

Journal Article · · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA)
DOI:https://doi.org/10.1116/1.577421· OSTI ID:5623048
; ; ; ; ;  [1];  [2]
  1. School of Electrical Engineering and Computer Science, University of Oklahoma, Norman, Oklahoma 73019 (USA)
  2. Materials Science and Engineering Department, North Carolina State University, Raleigh, North Carolina 27695-7916 (USA)

Metalorganic chemical vapor deposition (MOCVD) has the potential of emerging as a viable technique to fabricate ribbons, tapes, coated wires, and the deposition of films of high temperature superconductors, and related materials. As a reduced thermal budget processing technique, rapid isothermal processing (RIP) based on incoherent radiation as the source of energy can be usefully coupled to conventional MOCVD. In this paper we report on the deposition and characterization of high quality superconducting thin films of Y--Ba--Cu--O (YBCO) on MgO and SrTiO{sub 3} substrates by RIP assisted MOCVD. By using a mixture of N{sub 2}O and O{sub 2} as the oxygen source films deposited initially at 600 {degree}C for 1 min and then at 740 {degree}C for 30 min are primarily {ital c}-axis oriented and with zero resistance being observed at 84 and 89 K for MgO and SrTiO{sub 3} substrates, respectively. The zero magnetic field current densities at 77 K for MgO and SrTiO{sub 3} substrates are 1.2{times}10{sup 6} and 1.5{times}10{sup 6} A/cm{sup 2}, respectively. It is envisaged that high energy photons from the incoherent light source and the use of a mixture of N{sub 2}O and O{sub 2} as the oxygen source, assist chemical reactions and lower overall thermal budget for processing of these films.

OSTI ID:
5623048
Journal Information:
Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA) Vol. 9:3; ISSN 0734-2101; ISSN JVTAD
Country of Publication:
United States
Language:
English