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Metalorganic chemical vapor deposition of superconducting YBa sub 2 Cu sub 3 O sub 7 minus x in a high-speed rotating disk reactor

Journal Article · · Journal of Applied Physics; (USA)
DOI:https://doi.org/10.1063/1.343739· OSTI ID:5212581
;  [1]; ; ;  [2]; ; ;  [3]
  1. Department of Materials Science and Engineering, Stevens Institute of Technology, Hoboken, New Jersey 07030 (US)
  2. Department of Mechanics and Materials Science, Rutgers the State University of New Jersey, Piscataway, New Jersey (USA) 08854
  3. EMCORE Corporation, 35 Elizabeth Avenue, Somerset, New Jersey (USA) 08873

Metalorganic chemical vapor deposition (MOCVD) of YBa{sub 2}Cu{sub 3}O{sub 7{minus}{ital x}} films on (100) SrTiO{sub 3} was performed in a high-speed rotating disk reactor. Metal {beta}-diketonates were used as source materials. Energy dispersive spectroscopy analysis showed as-grown and post-annealed samples to have a composition matching that of superconducting thin-film standards. X-ray data showed the annealed films to be highly oriented with the {ital c} axis perpendicular to the substrate. The best films exhibited an onset temperature of 90 K and zero resistance at 88 K. The width of the superconductive transition ({lt}2 K) is the best value thus far reported for 123 films grown in a commercially available MOCVD system.

OSTI ID:
5212581
Journal Information:
Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 66:10; ISSN 0021-8979; ISSN JAPIA
Country of Publication:
United States
Language:
English