Design and fabrication of a computer-controlled rapid-isothermal-processing-assisted metalorganic chemical-vapor-deposition system for high-temperature superconducting thin films and related materials

Journal Article · Sun Jan 31 23:00:00 EST 1993 · Review of Scientific Instruments; (United States)

DOI:https://doi.org/10.1063/1.1144225· OSTI ID:5644592

Singh, R; Ng, J T.C. ^[1]; Sinha, S ^[2]; Dhall, V ^[3]

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1. Department of Electrical and Computer Engineering, Clemson University, Clemson, South Carolina 29634 (United States)
2. Department of Electrical Engineering, University of Florida, Gainesville, Florida 32611 (United States)
3. College of Business Administration, University of Oklahoma, Norman, Oklahoma 73019 (United States)

Metalorganic chemical vapor deposition (MOCVD) is an ideal technique for the development of several high-temperature superconducting products. For the development of certain electronic products, reduced thermal budget (product of processing time and temperature) processing is a necessity. Rapid isothermal processing (RIP) based on incoherent light as the source of energy is emerging as a key reduced thermal budget processing technique. Driven by potential applications a RIP-assisted MOCVD system has been designed and fabricated for the deposition of high-temperature superconducting thin films and related materials. Experimental details of the RIP-assisted MOCVD system are described. The results of Y-Ba-Cu-O (YBCO) films deposited on yttrium-stabilized zirconia, SrTiO[sub 3], and MgO substrates are also presented. In the case of SrTiO[sub 3] substrates, YBCO films were deposited at a substrate temperature of 640 [degree]C. The onset temperature is 91 K and the transition temperature [ital T][sub [ital c]] is observed at 89 K. The value of zero-magnetic-field current density [ital J][sub [ital c]] at 77 K is 1.5[times]10[sup 6] A/cm[sup 2]. The results presented represent the best values of transition temperature [ital T][sub [ital c]], [ital c]-axis orientation, and zero magnetic-field critical current density [ital J][sub [ital c]] values for the thermal budget used in the growth of the superconducting thin films by MOCVD.

• OSTI ID: 5644592
• Journal Information: Review of Scientific Instruments; (United States), Journal Name: Review of Scientific Instruments; (United States) Vol. 64:2; ISSN 0034-6748; ISSN RSINAK
• Country of Publication: United States
• Language: English

Related Subjects

661210* -- Cryogenics-- (1992-)
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ALKALINE EARTH METAL COMPOUNDS
BARIUM COMPOUNDS
BARIUM OXIDES
CHALCOGENIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
COMPUTERIZED CONTROL SYSTEMS
CONTROL SYSTEMS
COPPER COMPOUNDS
COPPER OXIDES
CRITICAL CURRENT
CURRENTS
DEPOSITION
DESIGN
ELECTRIC CURRENTS
FILMS
HIGH-TC SUPERCONDUCTORS
ON-LINE CONTROL SYSTEMS
ON-LINE SYSTEMS
OXIDES
OXYGEN COMPOUNDS
STRONTIUM COMPOUNDS
STRONTIUM TITANATES
SUPERCONDUCTING FILMS
SUPERCONDUCTORS
SURFACE COATING
TITANATES
TITANIUM COMPOUNDS
TRANSITION ELEMENT COMPOUNDS
YTTRIUM COMPOUNDS
YTTRIUM OXIDES