In situ deposition of BaF sub 2 as a buffer layer and the superconducting thin films of Y-Ba-Cu-O on silicon substrates by metalorganic chemical vapor deposition

Journal Article · Sun Apr 15 00:00:00 EDT 1990 · Journal of Applied Physics; (USA)

DOI:https://doi.org/10.1063/1.345020· OSTI ID:6837014

Singh, R; Sinha, S; Hsu, N J; Chou, P ^[1]

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1. School of Electrical Engineering, University of Oklahoma, Norman, Oklahoma 73019 (USA) Computer Science, University of Oklahoma, Norman, Oklahoma 73019 (USA)

High throughput, sharp interfaces, and selective deposition with direct ion-, electron-, and photon-beam-controlled techniques are some of the key driving forces for the development of superconducting thin films by the metalorganic chemical vapor deposition technique. In this paper, we report on the {ital in} {ital situ} deposition of a buffer layer of BaF{sub 2} and high-temperature superconducting thin films of Y-Ba-Cu-O by metalorganic chemical vapor deposition (MOCVD) on silicon substrates. These films have an on-set temperature of 90 K and zero resistance at 73 K. The use of BaF{sub 2} as a buffer layer on Si substrates suggests the possibility of three-dimensional integration with high-temperature superconducting thin films, for hybrid superconductor/semiconductor devices as well as superconducting switches and other related devices. To the best of our knowledge, this is the first report of the deposition of high-temperature superconducting thin films on Si by MOCVD.

• OSTI ID: 6837014
• Journal Information: Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 67:8; ISSN 0021-8979; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360204* -- Ceramics
Cermets
& Refractories-- Physical Properties
656100 -- Condensed Matter Physics-- Superconductivity
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALKALINE EARTH METAL COMPOUNDS
BARIUM COMPOUNDS
BARIUM FLUORIDES
BARIUM OXIDES
BUFFERS
CHALCOGENIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
COPPER COMPOUNDS
COPPER OXIDES
DEPOSITION
ELEMENTS
FILMS
FLUORIDES
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
LAYERS
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
SEMIMETALS
SILICON
SUBSTRATES
SUPERCONDUCTORS
SURFACE COATING
THERMODYNAMIC PROPERTIES
TRANSITION ELEMENT COMPOUNDS
TRANSITION TEMPERATURE
YTTRIUM COMPOUNDS
YTTRIUM OXIDES