Amorphous silicon carbide coatings for extreme ultraviolet optics

Journal Article · Fri Jul 15 04:00:00 EDT 1988 · Appl. Opt.; (United States)

DOI:https://doi.org/10.1364/AO.27.002841· OSTI ID:7202284

Kortright, J B; Windt, D L

Amorphous silicon carbide films formed by sputtering techniques are shown to have high reflectance in the extreme ultraviolet spectral region. X-ray scattering verifies that the atomic arrangements in these films are amorphous, while Auger electron spectroscopy and Rutherford backscattering spectroscopy show that the films have composition close to stoichiometric SiC, although slightly C-rich, with low impurity levels. Reflectance vs incidence angle measurements from 24 to 1216 A were used to derive optical constants of this material, which are presented here. Additionally, the measured extreme ultraviolet efficiency of a diffraction grating overcoated with sputtered amorphous silicon carbide is presented, demonstrating the feasibility of using these films as coatings for EUV optics.

• Research Organization: University of California, Lawrence Berkeley Laboratory, Center for X-Ray Optics, Berkeley, California 94720
• OSTI ID: 7202284
• Journal Information: Appl. Opt.; (United States), Journal Name: Appl. Opt.; (United States) Vol. 27:14; ISSN APOPA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360601 -- Other Materials-- Preparation & Manufacture
360603* -- Materials-- Properties
CARBIDES
CARBON COMPOUNDS
COATINGS
EFFICIENCY
ELECTROMAGNETIC RADIATION
EXTREME ULTRAVIOLET RADIATION
FABRICATION
GRATINGS
OPTICAL PROPERTIES
PERFORMANCE
PHYSICAL PROPERTIES
RADIATIONS
REFLECTIVE COATINGS
REFLECTIVITY
SAMPLE PREPARATION
SILICON CARBIDES
SILICON COMPOUNDS
SPUTTERING
STOICHIOMETRY
SURFACE PROPERTIES
ULTRAVIOLET RADIATION