Performance, structure, and stability of SiC/Al multilayer films for extreme ultraviolet applications
We report on the performance, structure and stability of periodic multilayer films containing silicon carbide (SiC) and aluminum (Al) layers designed for use as reflective coatings in the extreme ultraviolet (EUV). We find that SiC/Al multilayers prepared by magnetron sputtering have low stress, good temporal and thermal stability, and provide good performance in the EUV, particularly for applications requiring a narrow spectral bandpass, such as monochromatic solar imaging. Transmission electron microscopy reveals amorphous SiC layers and polycrystalline Al layers having a strong <111> texture, and relatively large roughness associated with the Al crystallites. Fits to EUV reflectance measurements also indicate large interface widths, consistent with the electron microscopy results. SiC/Al multilayers deposited by reactive sputtering with nitrogen comprise Al layers that are nearly amorphous and considerably smoother than films deposited nonreactively, but no improvements in EUV reflectance were obtained.
- OSTI ID:
- 22036407
- Journal Information:
- Applied Optics, Vol. 48, Issue 26; Other Information: (c) 2009 Optical Society of America; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6935
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALUMINIUM
EXTREME ULTRAVIOLET RADIATION
INTERFACES
INTERFERENCE
LAYERS
MAGNETRONS
MONOCHROMATIC RADIATION
OPTICAL PROPERTIES
PERFORMANCE
PERIODICITY
REFLECTIVE COATINGS
ROUGHNESS
SILICON CARBIDES
SPUTTERING
STABILITY
TEXTURE
THIN FILMS
TRANSMISSION ELECTRON MICROSCOPY
X RADIATION