Terbium-Based Extreme Ultraviolet Multilayers

Journal Article · Sat Jan 01 04:00:00 EST 2005 · Opt. Lett.

DOI:https://doi.org/10.1364/OL.30.003186· OSTI ID:913856

Windt, D; Seely, J; Kjornrattanawich, B; Uspenskii, Y

We have fabricated periodic multilayers that comprise either Si/Tb or SiC/Tb bilayers, designed to operate as narrowband reflective coatings near 60 nm wavelength in the extreme ultraviolet (EUV). We find peak reflectance values in excess of 20% near normal incidence. The spectral bandpass of the best Si/Tb multilayer was measured to be 6.5 nm full width at half-maximum (FWHM), while SiC/Tb multilayers have a more broad response, of order 9.4 nm FWHM. Transmission electron microscopy analysis of Si/Tb multilayers reveals polycrystalline Tb layers, amorphous Si layers, and relatively large asymmetric amorphous interlayers. Thermal annealing experiments indicate excellent stability to 100 C (1 h) for Si/Tb. These new multilayer coatings have the potential for use in normal incidence instrumentation in a region of the EUV where efficient narrowband multilayers have not been available until now. In particular, reflective Si/Tb multilayers can be used for solar physics applications where the coatings can be tuned to important emission lines such as O V near 63.0 nm and Mg X near 61.0 nm.

• Research Organization: Brookhaven National Laboratory (BNL) National Synchrotron Light Source
• Sponsoring Organization: Doe - Office Of Science
• DOE Contract Number: AC02-98CH10886
• OSTI ID: 913856
• Report Number(s): BNL--78424-2007-JA
• Journal Information: Opt. Lett., Journal Name: Opt. Lett. Journal Issue: 23 Vol. 30; ISSN 0146-9592; ISSN OPLEDP
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
EXTREME ULTRAVIOLET RADIATION
FABRICATION
REFLECTIVE COATINGS
SILICON
SILICON CARBIDES
TERBIUM
national synchrotron light source