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Effect of temperature on the attachment of slow ( le 1 eV) electrons to CH sub 3 Br

Journal Article · · Journal of Chemical Physics; (United States)
DOI:https://doi.org/10.1063/1.463329· OSTI ID:7198437
; ;  [1]
  1. Atomic, Molecular, and High Voltage Physics Group, Health and Safety Research Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6122 (United States)
The electron attachment rate constant {ital k}{sub {ital a}}({l angle}{epsilon}{r angle}, {ital T}) for CH{sub 3}Br has been measured in a buffer gas of N{sub 2} using a high pressure electron swarm apparatus, within the mean electron energy range from thermal ({similar to}0.046 eV) to 0.87 eV and over the temperature range, {ital T}, 300--700 K. At room temperature, CH{sub 3}Br attaches low energy electrons weakly but as {ital T} is raised from 300 to 700 K the total electron attachment cross section increases by more than 2 orders of magnitude. At {ital T}=300 K the electron attachment cross section exhibits a peak at 0.38 eV which shifts progressively to lower electron energies as {ital T} is increased. The thermal value of {ital k}{sub {ital a}} is 1.08{times}10{sup {minus}11} cm{sup 3} s{sup {minus}1} at 300 K and 3.28{times}10{sup {minus}9} cm{sup 3} s{sup {minus}1} at 700 K.
DOE Contract Number:
AC05-84OR21400
OSTI ID:
7198437
Journal Information:
Journal of Chemical Physics; (United States), Journal Name: Journal of Chemical Physics; (United States) Vol. 97:12; ISSN JCPSA; ISSN 0021-9606
Country of Publication:
United States
Language:
English