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Variation with temperature of the dissociative electron attachment to CH{sub 3}Br

Journal Article · · Bulletin of the American Physical Society
OSTI ID:127979
; ;  [1]
  1. Oak Ridge National Lab., TN (United States)
The dissociative electron attachment to CH{sub 3}Br exhibits a remarkable dependence on the gas temperature. Low energy electrons (<1 eV) attach very weakly and dissociatively to CH{sub 3}Br at T=300 K but as T is increased to 700 K the electron attachment rate constant, k{sub a}({epsilon},T) increases by more that 2 orders of magnitude; the thermal value of k{sub a} is 1.08x10{sup {minus}11} cm{sup 3}s{sup {minus}1} at 300 K and increases (by more than 300 times) to 3.28x10{sup {minus}9} cm{sup 3}s{sup {minus}1} as T is raised to 700 K. The profound increases in k{sub a} with small changes in the internal energy of CH{sub 3}Br (which may be induced also with infrared excitation) make this molecule a potential candidate for pulsed power switching applications.
DOE Contract Number:
AC05-84OR21400
OSTI ID:
127979
Report Number(s):
CONF-920376--
Journal Information:
Bulletin of the American Physical Society, Journal Name: Bulletin of the American Physical Society Journal Issue: 9 Vol. 37; ISSN BAPSA6; ISSN 0003-0503
Country of Publication:
United States
Language:
English

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