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Variation with temperature of the electron attachment to SO/sub 2/F/sub 2/

Journal Article · · J. Chem. Phys.; (United States)
OSTI ID:6438135

The total electron attachment rate constant k/sub a/(,T) for SO/sub 2/F/sub 2/ has been measured, in a buffer gas of N/sub 2/, as a function of the mean electron energy (0.046--0.911 eV) and temperature T (300--700 K) using an electron swarm technique. From the measured k/sub a/(,T), the total electron attachment cross sections sigma/sub a/(epsilon,T) were determined. At 300 K the sigma/sub a/(epsilon,T) exhibits a maximum at approx.0.22 eV which is due to dissociative electron attachment and an increase below approx.0.1 eV which is due to the formation of parent negative ions SO/sub 2/F/sup -//sub 2/ at near zero energy. At T = 400 K, sigma/sub a/(epsilon,T) has only one main peak at approx.0.13 eV which is due only to dissociative electron attachment reflecting the depletion of the parent anions and the prevalence of the fragment negative ions as T increases. The main peak of sigma/sub a/(epsilon,T) shifts to lower electron energies with increasing T so that at 700 K the peak is located at approx.0.03 eV. The value, sigma/sub d//sub a/(epsilon/sub max/), of the total electron attachment cross section at the peak energy epsilon/sub max/ increases by a factor of approx.32 as T increases from 300 to 700 K.

Research Organization:
Atomic, Molecular, and High Voltage Physics Group, Health and Safety Research Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6122
OSTI ID:
6438135
Journal Information:
J. Chem. Phys.; (United States), Journal Name: J. Chem. Phys.; (United States) Vol. 90:5; ISSN JCPSA
Country of Publication:
United States
Language:
English