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Traps in molecular-beam epitaxial In sub 0. 53 (Ga sub x Al sub 1 minus x ) sub 0. 47 As/InP

Journal Article · · Journal of Applied Physics; (USA)
DOI:https://doi.org/10.1063/1.345492· OSTI ID:7197983
; ; ;  [1]
  1. Center for High-Frequency Microelectronics and Solid State Electronics Laboratory, Department of Electrical Engineering and Computer Science, The University of Michigan, Ann Arbor, Michigan 48109-2122 (USA)
Deep-level transient spectroscopy measurements have been made on molecular-beam epitaxial In{sub 0.53}(Ga{sub {ital x}}Al{sub 1{minus}{ital x}}){sub 0.47}As lattice matched to InP. Several electron and hole traps, with activation energies ranging from 0.14 to 0.79 eV, have been identified and characterized. In particular, systems of electron traps (0.30{le}{Delta}{ital E}{sub {ital T}}{le}0.79 eV) and hole traps (0.14{le}{Delta}{ital E}{sub {ital T}}{le}0.31 eV) with monotonically changing activation energies have been identified in these alloys. We believe these traps are dominant in this alloy system.
OSTI ID:
7197983
Journal Information:
Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 67:5; ISSN 0021-8979; ISSN JAPIA
Country of Publication:
United States
Language:
English