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Room-temperature operation of lattice-matched InP/Ga/sub 0. 47/In/sub 0. 53/As/InP double-heterostructure lasers grown by MBE

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.90186· OSTI ID:6803725

Molecular beam epitaxial (MBE) growth of InP/Ga/sub 0.47/In/sub 0.53/As/InP double heterostructures has resulted in pulsed room-temperature lasing at 1.65 ..mu..m. Thresholds as low as 3.2 kA/cm/sup 2/ for a 0.6-..mu..m-thick layer has been achieved. These results were achieved by ''premixing'' the Ga and In together in a common source oven and precisely monitoring the Ga/In flux ratio during the growth of the Ga/sub 0.47/In/sub 0.53/As layer. Cd diffusion from a vapor source allowed us to p dope the top InP layer in the as-grown MBE wafer.

Research Organization:
Bell Telephone Laboratories, Holmdel, New Jersey 07733
OSTI ID:
6803725
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 33:1; ISSN APPLA
Country of Publication:
United States
Language:
English