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Ga/sub 0. 47/In/sub 0. 53/As/InP double-heterostructure and multiquantum well lasers grown by chemical beam epitaxy

Journal Article · · IEEE J. Quant. Electron.; (United States)
The authors reported the successful preparation by chemical beam epitaxy (CBE) and performance characteristics of Ga/sub 0.47/In/sub 0.53/As/InP DH and MQW lasers emitting at 1.47-1.72 ..mu..m. The very low threshold current densities of 1.3 and 1.5 kA/cm/sup 2/ obtained for DH and MQW laser wafers, respectively, suggest that the present materials and heterointerfaces are of high quality. In fact these J/sub th/'s are the lowest obtained thus far for such lasers. Such results are consistent with the extremely high-quality Ga/sub 0.47/In/sub 0.53/As epilayers and Ga/sub 0.47/In/sub 0.53/As/InP quantum well structures also obtained grown by this technique. Differential quantum efficiency of -- 18 percent per facet was obtained for both DH and MQW lasers. Further, we were also able to show that there was a definite improvement in T/sub o/ from --35-45 K for DH laser wafers to -- 65-80 K for MQW laser wafers in contrast to previous experimental results.
Research Organization:
AT and T Bell Labs., Holmdel, NJ 07733
OSTI ID:
6361918
Journal Information:
IEEE J. Quant. Electron.; (United States), Journal Name: IEEE J. Quant. Electron.; (United States) Vol. QE-23:6; ISSN IEJQA
Country of Publication:
United States
Language:
English