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Chemical beam epitaxial growth of very low threshold Ga/sub 0. 47/In/sub 0. 53/As/InP double-heterostructure and multiquantum well lasers

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.97455· OSTI ID:5158492
We report the successful preparation by chemical beam epitaxy and performance characteristics of Ga/sub 0.47/In/sub 0.53/As/InP double-heterostructure (DH) and multiquantum well (MQW) lasers emitting at 1.47-1.72 ..mu..m. The very low threshold current densities J/sub th/ of 1.3 kA/cm/sup 2/ and 1.5 kA/cm/sup 2/ obtained from DH and MQW laser wafers, respectively, suggest that the present materials and heterointerfaces are superior to those obtained previously by other techniques. In fact, these J/sub th/'s are the lowest obtained thus far for such lasers. Differential quantum efficiency of --18% per facet was obtained for both DH and MQW lasers. Furthermore, we were able to show that there was a definite improvement in the threshold-temperature dependence characteristic coefficient T/sub 0/ from --35-45 K for DH laser wafers to --65-80 K for MQW laser wafers in contrast to previous experimental results.
Research Organization:
ATandT Bell Laboratories, Holmdel, New Jersey 07733
OSTI ID:
5158492
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 49:16; ISSN APPLA
Country of Publication:
United States
Language:
English