Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Reduction of capture barrier height of pressure-induced deep donors (DX center) in GaAs:Si

Conference ·
OSTI ID:7180751
When boron was introduced into GaAs:Si, the DX-like deep donors which appeared in GaAs under pressure were found to disappear while new centers with reduced capture barrier heights appeared. It is proposed that B atoms paired up with Si donor atoms. The reduction in the capture barrier height is interpreted in terms of a recent model proposed by Chadi and Chang. 12 refs., 3 figs., 1 tab.
Research Organization:
Lawrence Berkeley Lab., CA (USA)
DOE Contract Number:
AC03-76SF00098
OSTI ID:
7180751
Report Number(s):
LBL-25692; CONF-8808106-2; ON: DE88016639
Country of Publication:
United States
Language:
English