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Amorphous silicon pixel radiation detectors and associated thin film transistor electronics readout

Conference ·
OSTI ID:7161817
; ; ; ; ; ;  [1];  [2];  [3]
  1. Lawrence Berkeley Lab., CA (United States)
  2. Air Techniques Corp., Hicksville, New York (United States)
  3. NEC Corp., Tokyo (Japan)
We describe the characteristics of thin (1 {mu}m) and thick (> 30 {mu}m) hydrogenated amorphous silicon p-i-n diodes which are optimized for detecting and recording the spatial distribution of charged particles, x-ray, {gamma} rays and thermal neutrons. For x-ray, {gamma} ray, and charged particle detection we can use thin p-i-n photosensitive diode arrays coupled to evaporated layers of suitable scintillators. For thermal neutron detection we use thin (2{approximately}5 {mu}m) gadolinium converters on 30 {mu}m thick a-Si:H diodes. For direct detection of minimum ionizing particles and others with high resistance to radiation damage, we use the thick p-i-n diode arrays. Diode and amorphous silicon readouts as well as polysilicon pixel amplifiers are described.
Research Organization:
Lawrence Berkeley Lab., CA (United States)
Sponsoring Organization:
DOE; USDOE, Washington, DC (United States)
DOE Contract Number:
AC03-76SF00098
OSTI ID:
7161817
Report Number(s):
LBL-32460; CONF-9206222--2; ON: DE92040379
Country of Publication:
United States
Language:
English