Amorphous silicon pixel radiation detectors and associated thin film transistor electronics readout
Conference
·
OSTI ID:10177861
- Lawrence Berkeley Lab., CA (United States)
- Air Techniques Corp., Hicksville, New York (United States)
- NEC Corp., Tokyo (Japan)
We describe the characteristics of thin (1 {mu}m) and thick (> 30 {mu}m) hydrogenated amorphous silicon p-i-n diodes which are optimized for detecting and recording the spatial distribution of charged particles, x-ray, {gamma} rays and thermal neutrons. For x-ray, {gamma} ray, and charged particle detection we can use thin p-i-n photosensitive diode arrays coupled to evaporated layers of suitable scintillators. For thermal neutron detection we use thin (2{approximately}5 {mu}m) gadolinium converters on 30 {mu}m thick a-Si:H diodes. For direct detection of minimum ionizing particles and others with high resistance to radiation damage, we use the thick p-i-n diode arrays. Diode and amorphous silicon readouts as well as polysilicon pixel amplifiers are described.
- Research Organization:
- Lawrence Berkeley Lab., CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 10177861
- Report Number(s):
- LBL--32460; CONF-9206222--2; ON: DE92040379
- Country of Publication:
- United States
- Language:
- English
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