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Surface analysis: x-ray photoelectron spectroscopy and auger electron spectroscopy

Journal Article · · Anal. Chem.; (United States)
DOI:https://doi.org/10.1021/ac00163a024· OSTI ID:7160464

This fundamental review is on the subject of X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) and will cover the literature abstracted in Chemical Abstracts between November 18, 1985, and November 6, 1987. The review is written in three separate parts for the convenience of the reader: section A, XPS; section B, AES; and section C, combined SPX-AES topics. However, for those who use only one of these techniques, there may be items of interest in the other sections. XPS and AES are used widely for the analysis of surfaces. From about 1970 to the present time, these techniques have grown in acceptance by the scientific community. Much of this activity has been documented in earlier fundamental and application reviews in Analytical Chemistry. While this review is lengthy, it is not an all-inclusive bibliography of XPS and AES during the review period. The articles have been selected with the idea of the improvement in the state-of-the-art of these techniques. The goal of this review is to help analysts solve the problems that are encountered in using XPS and AES in a routine laboratory setting with commercially available equipment. A section on inelastic mean free paths (IMFP) will be in the combined XPS-AES part of this review.

Research Organization:
Naval Research Lab., Washington, DC (USA)
OSTI ID:
7160464
Journal Information:
Anal. Chem.; (United States), Journal Name: Anal. Chem.; (United States) Vol. 60:12; ISSN ANCHA
Country of Publication:
United States
Language:
English