Surface analysis: X-ray photoelectron spectroscopy and Auger electron spectroscopy
This fundamental review is on the subject of X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) for the period of 1983-1985. The review will cover the literature abstracted in Chemical Abstracts between November 16, 1983, and November 4, 1985. The review is written in three separate parts for the convenience of the reader: section A, XPS; section B, AES; and section C, combined XPS-AES topics. XPS and AES are used widely for the analysis of surfaces. From about 1970 to the present time, these techniques have grown in acceptance by the scientific community. Much of this activity has been documented in earlier Fundamental and Application Reviews in Analytical Chemistry. While this review is lengthy, it is not an all-inclusive bibliography of XPS and AES during the review period. The articles have been selected with the idea of the improvement in the state-of-the-art of these techniques. The goal of this review is to help analysts solve the problems that are encountered in using XPS and AES in a regular laboratory with commercially available equipment. 382 references.
- Research Organization:
- Naval Research Lab., Washington, DC
- OSTI ID:
- 5699626
- Journal Information:
- Anal. Chem.; (United States), Journal Name: Anal. Chem.; (United States) Vol. 58:5; ISSN ANCHA
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
400104* -- Spectral Procedures-- (-1987)
AUGER ELECTRON SPECTROSCOPY
BACKSCATTERING
BINDING ENERGY
BIOLOGICAL MATERIALS
CHEMICAL ANALYSIS
DATA ANALYSIS
DOCUMENT TYPES
ELECTROMAGNETIC RADIATION
ELECTRON SPECTROSCOPY
ENERGY
IONIZING RADIATIONS
MATERIALS
PHOTOELECTRON SPECTROSCOPY
POLYMERS
QUANTITATIVE CHEMICAL ANALYSIS
RADIATIONS
REVIEWS
SCATTERING
SENSITIVITY
SPECTROSCOPY
SURFACES
USES
X RADIATION