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Surface analysis: X-ray photoelectron spectroscopy and Auger electron spectroscopy

Journal Article · · Anal. Chem.; (United States)
DOI:https://doi.org/10.1021/ac00296a014· OSTI ID:5699626

This fundamental review is on the subject of X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) for the period of 1983-1985. The review will cover the literature abstracted in Chemical Abstracts between November 16, 1983, and November 4, 1985. The review is written in three separate parts for the convenience of the reader: section A, XPS; section B, AES; and section C, combined XPS-AES topics. XPS and AES are used widely for the analysis of surfaces. From about 1970 to the present time, these techniques have grown in acceptance by the scientific community. Much of this activity has been documented in earlier Fundamental and Application Reviews in Analytical Chemistry. While this review is lengthy, it is not an all-inclusive bibliography of XPS and AES during the review period. The articles have been selected with the idea of the improvement in the state-of-the-art of these techniques. The goal of this review is to help analysts solve the problems that are encountered in using XPS and AES in a regular laboratory with commercially available equipment. 382 references.

Research Organization:
Naval Research Lab., Washington, DC
OSTI ID:
5699626
Journal Information:
Anal. Chem.; (United States), Journal Name: Anal. Chem.; (United States) Vol. 58:5; ISSN ANCHA
Country of Publication:
United States
Language:
English