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Admittance studies of neutron-irradiated silicon p/sup +/-n diodes

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.323850· OSTI ID:7120682

Defects introduced in n-type silicon by neutron irradiation were investigated by measuring the conductance (G) and the capacitance (C) of p/sup +/-n diodes. The method of the determination of the energy level, capture cross section, and concentration for each defect from the G-T and C-T curves for various frequencies was presented. Assuming that capture cross sections are independent of temperature, the energy levels of E/sub c/-0.15 eV, E/sub c/-0.22 eV, and E/sub c/-0.39 eV were obtained. For these defects, the calculated values of the electron capture cross section were 2.6 x 10/sup -14/, 3.7 x 10/sup -15/, and 2.0 x 10/sup -14/ cm/sup 2/, respectively. The introduction rate of defects for E/sub c/-0.39 eV was twice that for E/sub c/-0.22 eV which was twice that for E/sub c/-0.15 eV. Comparing with other published data, the energy levels of E/sub c/-0.15 eV and E/sub c/-0.39 eV were found to be correlated with the A center and the divacancy, respectively.

Research Organization:
Department of Electronics, Aichi Institute of Technology, Yagusa, Toyota, Japan
OSTI ID:
7120682
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 48:4; ISSN JAPIA
Country of Publication:
United States
Language:
English