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Title: Studies of annealing of neutron-produced defects in silicon by transconductance measurements of junction field-effect transistors

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.324319· OSTI ID:5242679

Annealing behavior of neutron-produced defects in silicon was studied by measuring the phase angle theta of the small-signal transconductance of the junction field-effect transistors (JFET's). Three deep levels (N-1, N-2, and N-3 levels) in n-type silicon and two deep levels (P-1 and P-2 levels) in p-type silicon, introduced by irradiation, annealed gradually. Their energy levels and capture cross sections have been already reported by us. Three deep levels (P-3, P-4, and P-5 levels) were observed in annealed p-type silicon in the temperature range 150--300 /sup 0/C. For these defects, theta was measured as a function of frequency to obtain the time constant. From the temperature dependence of the time constant, assuming that capture cross sections are independent of temperature, the energy levels of P-3, P-4, and P-5 were estimated to be E/sub v/+0.21, E/sub v/+0.40, and E/sub v/+0.30 eV, respectively. The calculated hole capture cross sections of these levels were 2.2 x 10/sup -15/, 8.7 x 10/sup -14/, and 1.2 x 10/sup -14/ cm/sup 2/, respectively. Comparison with other published data was made. It was found that N-3 and P-2 levels corresponded to the divacancy. Furthermore, it seemed that P-3, P-4, and P-5 levels corresponded to the high-order vacancy defects.

Research Organization:
Department of Electronics, Aichi Institute of Technology, Yagusa, Toyota, Japan
OSTI ID:
5242679
Journal Information:
J. Appl. Phys.; (United States), Vol. 49:1
Country of Publication:
United States
Language:
English