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Title: Long-term annealing study of midgap interface-trap charge neutrality

Journal Article · · Applied Physics Letters; (United States)
DOI:https://doi.org/10.1063/1.106807· OSTI ID:7113591
 [1]
  1. Sandia National Laboratories, Department 1332, Albuquerque, New Mexico 87185-5800 (United States)

Non-radiation-hardened metal-oxide-semiconductor (MOS) devices were irradiated to doses from 30 to 90 krad(SiO{sub 2}) and baked at 100 {degree}C under positive bias for 2.75 yr. Threshold-voltage shifts due to radiation-induced oxide- and interface-trap charge were estimated via the subthreshold current-voltage technique of McWhorter and Winokur (Appl. Phys. Lett. {bold 48}, 133 (1986)), which depends on the assumption that radiation-induced interface traps are neutral at midgap surface potential. The oxide-trap charge inferred via this technique asymptotically approached zero {similar to}9 months after irradiation and remained constant for the next 2 yr, despite large changes in the subthreshold current-voltage characteristics caused by changes in interface-trap density (which increased during the first 4--9 months of 100 {degree}C annealing, then decreased during the remaining 2--2.5 yr). This strongly reinforces the often controversial idea that radiation-induced interface traps are charge-neutral at midgap. Finally, a new figure of merit is developed to assess the self-consistency of interface-trap charge measurements on irradiated MOS devices.

DOE Contract Number:
AC04-76DP00789
OSTI ID:
7113591
Journal Information:
Applied Physics Letters; (United States), Vol. 60:23; ISSN 0003-6951
Country of Publication:
United States
Language:
English