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Theory and application of dual-transistor charge separation analysis

Conference · · IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (USA)
DOI:https://doi.org/10.1109/23.45374· OSTI ID:7002155
; ; ;  [1];  [2]
  1. Sandia National Labs, Alburquerque, NM (US)
  2. Allied-Signal Aerospace Co., Albuquerque, NM (US)

The authors describe a dual-transistor charge separation method to evaluate the radiation response of MOS transistors. This method requires that n- and p-channel transistors with identically processed oxides be irradiated under identical conditions at the same oxide electric fields. Combining features of single-transistor midgap and mobility methods, the authors show how one may determine threshold voltage shifts due to oxide-trapped and interface-trapped charge from standard threshold voltage and mobility measurements. These measurements can be made at currents 2-5 orders of magnitude higher than those required for midgap, subthreshold slope, and charge-pumping methods. The dual-transistor method contains no adjustable parameters, and includes an internal self-consistency check. The accuracy of the method is verified by comparison to midgap, subthreshold slope, and charge-pumping methods for several MOS processes and technologies.

DOE Contract Number:
AC04-76DP00789
OSTI ID:
7002155
Report Number(s):
CONF-890723--
Journal Information:
IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (USA), Journal Name: IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (USA) Vol. 36; ISSN 0018-9499; ISSN IETNA
Country of Publication:
United States
Language:
English