Wavelength dependence of the resist sidewall angle in extreme ultraviolet lithography

Journal Article · Mon Oct 31 23:00:00 EST 1994 · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States)

DOI:https://doi.org/10.1116/1.587451· OSTI ID:7094682

Wood, II, O R; Bjorkholm, J E; Fetter, L; Himel, M D; Tennant, D M ^[1]; MacDowell, A A; La Fontaine, B ^[2]; Griffith, J E; Taylor, G N; Waskiewicz, W K; Windt, D L ^[3]; Kortright, J B; Gullikson, E K; Nguyen, K ^[4]

---

1. AT T Bell Laboratories, Holmdel, New Jersey 07733-3030 (United States)
2. AT T Bell Laboratories, Brookhaven National Laboratory, Upton, New York 11973 (United States)
3. AT T Bell Laboratories, Murray Hill, New Jersey 07974-0636 (United States)
4. Lawrence Berkeley Laboratory, Berkeley, California 94720 (United States)

We report experimental and theoretical studies of the resist sidewall angles produced using extreme ultraviolet lithography at exposure wavelengths of 37.5, 13.9, and 6.8 nm. We show that high resist absorption in this wavelength region leads to a significant degradation in pattern sidewall angle. Because steep resist profiles are needed in semiconductor manufacturing to ensure adequate linewidth control it seems unlikely that a single-layer resist process can be used in extreme ultraviolet lithography except at the shortest wavelength.

• OSTI ID: 7094682
• Journal Information: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States), Journal Name: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States) Vol. 12:6; ISSN JVTBD9; ISSN 0734-211X
• Country of Publication: United States
• Language: English

Related Subjects

665000* -- Physics of Condensed Matter-- (1992-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ABSORPTIVITY
DIMENSIONS
ELECTROMAGNETIC RADIATION
ELECTRONIC CIRCUITS
ESTERS
EXTREME ULTRAVIOLET RADIATION
FABRICATION
INTEGRATED CIRCUITS
MICROELECTRONIC CIRCUITS
OPTICAL PROPERTIES
ORGANIC COMPOUNDS
ORGANIC POLYMERS
PHYSICAL PROPERTIES
PMMA
POLYACRYLATES
POLYMERS
POLYVINYLS
RADIATIONS
ULTRAVIOLET RADIATION
WAVELENGTHS