Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Cu/PI and Cu/PET adhesion: Influence of Si sup + ion mixing

Journal Article · · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)
DOI:https://doi.org/10.1116/1.578060· OSTI ID:7069944
 [1]
  1. Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States)
The adhesion and interfacial chemistry of 50 nm Cu films on poly({ital N},{ital N}- ({ital p},{ital p}{prime}-oxydiphenylene) pyromellitimide) (PI) and poly(ethylene terephthalate) (PET) substrates were examined as a function of {sup 28}Si{sup +} implantation through the interfaces. The implantation was performed with 70 keV {sup 28}Si{sup +} to doses between 1 and 10{times}10{sup 16} Si/cm{sup 2}, while the substrate temperature was kept between 50 and 80 {degree}C. The implantation induced extensive interfacial mixing and interfacial chemistry changes in both the Cu/PI and Cu/PET specimens. X-ray photoelectron spectroscopy analysis of the ion-induced Cu/PI interfacial chemistry indicated that the implanted {sup 28}Si{sup +} had reacted with both the film substrate species to form Cu--Si, Si--O, and Si--C bonding, which suggested the formation of interfacial complexes, such as Cu--Si--C and Cu--Si--O--C. Similar interfacial chemistry was produced in the Cu/PET specimens by the implantation. However, additional Cu 2{ital p}{sub 3/2} and O 1{ital s} peaks associated with Cu--O--Si bonding were observed, suggesting the formation of Cu--O--Si--C interfacial complexes. Despite these changes in interfacial chemistry, only small (factor of 2) changes in adhesion were observed upon scratch testing. The absence of larger adhesion increases was attributed to the rather weak bonding between Cu and Si.
DOE Contract Number:
AC04-76DP00789
OSTI ID:
7069944
Journal Information:
Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) Vol. 10:2; ISSN JVTAD; ISSN 0734-2101
Country of Publication:
United States
Language:
English

Similar Records

Ni/quartz adhesion enhancement: Comparison of Ar sup + and Si sup + ion mixing
Journal Article · Thu Oct 31 23:00:00 EST 1991 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) · OSTI ID:5157914

Ion mixing of Al/sub 2/O/sub 3/ and Al films on SiO/sub 2/
Journal Article · Mon Feb 29 23:00:00 EST 1988 · J. Vac. Sci. Technol., A; (United States) · OSTI ID:5489739

X-ray emission study of ion beam mixed Cu/Al films on polyimide
Journal Article · Sun Feb 28 23:00:00 EST 1999 · Journal of Vacuum Science and Technology, A · OSTI ID:321487