Ni/quartz adhesion enhancement: Comparison of Ar sup + and Si sup + ion mixing

Journal Article · Fri Nov 01 04:00:00 EST 1991 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)

DOI:https://doi.org/10.1116/1.577150· OSTI ID:5157914

Galuska, A A ^[1]

---

1. Sandia National Laboratories, Albuquerque, New Mexico (USA)

The adhesion between 30 nm Ni films and quartz substrates was examined as a function of the interfacial chemistry and mixing induced by low temperature ({lt}100 {degree}C) {sup 40}Ar{sup +} and {sup 28}Si{sup +} ion mixing. The Ni/quartz specimens were implanted with either 65 keV {sup 40}Ar{sup +} or 55 keV {sup 28}Si{sup +} to doses between 1 and 10{times}10{sup 16} atom/cm{sup 2}. Both types of implants were observed to induce extensive interfacial grading. X-ray photoelectron spectroscopy analyses indicated that Ni--O--Si types of interfacial complexes were present in the as-deposited specimens, but that these complexes were eliminated by the {sup 40}Ar{sup +} ion mixing. In contrast, high dose {sup 28}Si{sup +} ion mixing was shown to induce the formation of new interfacial complexes (Ni--Si--O and new Ni--O--Si complexes). Adhesion measurements, performed using a scratch tester, indicated that the adhesion of the as-deposited specimens was good (20 N), but that this adhesion got progressively worse (to less than 1 N) with {sup 40}Ar{sup +} implantation. In the case of {sup 28}Si{sup +} ion mixing, adhesion was reduced (to 5 N) in the low dose specimens, but was substantially increased (to 45 N) in the high dose specimens. Overall, Ni/quartz adhesion was shown to correlate with the concentration of interfacial complexes that could chemically attach the Ni films and quartz substrates.

• OSTI ID: 5157914
• Journal Information: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) Vol. 9:6; ISSN 0734-2101; ISSN JVTAD
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400201* -- Chemical & Physicochemical Properties
ADHESION
ARGON IONS
CHARGED PARTICLES
ELEMENTS
FILMS
ION IMPLANTATION
IONS
METALS
MINERALS
MULTICHARGED IONS
NICKEL
OXIDE MINERALS
QUARTZ
SILICON IONS
TRANSITION ELEMENTS