Reaction layer formation and fracture at chemically vapor deposited diamond/metal interfaces

Journal Article · Fri Jul 01 04:00:00 EDT 1994 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)

DOI:https://doi.org/10.1116/1.579347· OSTI ID:7028342

Perry, S S; Somorjai, G A ^[1]

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1. Department of Chemistry and Lawrence Berkeley Laboratory, University of California, Berkeley, California 94720 (United States)

Chemically vapor deposited (CVD) diamond films have been deposited by a microwave enhanced deposition process on metal substrates including titanium, tungsten, molybdenum, and copper. Boundary reaction layers formed at the interface during the growth of the CVD diamond films have been investigated for each of these systems. In these studies, the interface has been exposed by mechanically deforming the metal substrate to cause film delamination. Where the diamond film has adhered to the substrate through the growth process, delamination procedures have been carried out under controlled conditions in order to preserve the integrity of the interfacial species. The exposed interfaces were characterized by x-ray photoelectron spectroscopy, scanning Auger microscopy, secondary electron microscopy, and Raman microprobe spectroscopy. Reaction layers composed of carbides and oxides of the native metal were detected at the interfaces of titanium, tungsten, and molybdenum while only traces of carbon and oxygen were detected at the diamond/copper interface. We believe that both the chemical composition and morphology of the interface influence the adhesive properties of the diamond coating. Correlated investigations of the interfacial surfaces reveal that fracture of the diamond/metal interface occurs discretely at the diamond nucleation plane or within a reaction layer near the diamond interface.

• DOE Contract Number: AC03-76SF00098
• OSTI ID: 7028342
• Journal Information: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) Vol. 12:4; ISSN 0734-2101; ISSN JVTAD6
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360602* -- Other Materials-- Structure & Phase Studies
360603 -- Materials-- Properties
ADHESION
CARBIDES
CARBON
CARBON COMPOUNDS
CHALCOGENIDES
CHEMICAL COATING
CHEMICAL COMPOSITION
CHEMICAL VAPOR DEPOSITION
COPPER
DEPOSITION
DIAMONDS
ELEMENTAL MINERALS
ELEMENTS
FILMS
FRACTURE PROPERTIES
INTERFACES
MECHANICAL PROPERTIES
METALS
MINERALS
MOLYBDENUM
NONMETALS
OXIDES
OXYGEN COMPOUNDS
SURFACE COATING
TITANIUM
TRANSITION ELEMENTS
TUNGSTEN