Interface characterization of chemically vapor deposited diamond on titanium and Ti-6Al-4V
- Materials Science Division, Lawrence Berkeley Laboratory (United States) Department of Chemistry, University of California, Berkeley, California 94720 (United States)
- Crystallume, Menlo Park, California 94025 (United States)
Continuous 1-[mu]m-thick diamond films have been grown by chemical vapor deposition (CVD) at [similar to]900 [degree]C on pure titanium and on a Ti alloy, Ti-6Al-4V. The diamond film exhibits good adhesion to the substrates in spite of the presence of [similar to]7 GPa of in-plane residual stress which arises from the large differences in thermal expansion coefficients between diamond and titanium. The interface between the CVD diamond film and the substrate was exposed by deforming the substrate, thereby removing parts of the diamond film, under both ultrahigh vacuum and ambient conditions. After fracture, both the substrate and diamond film sides of the interface were characterized by a combination of x-ray photoelectron spectroscopy (XPS), scanning Auger microscopy, secondary electron microscopy, and Raman microprobe spectroscopy. The substrate fracture surface is inhomogeneous, containing some areas of diamond and amorphous carbon. XPS analysis revealed that carbon and oxygen are present on the substrate fracture surface. Micron-size areas of Ti were also found on the diamond fracture surface. Raman spectroscopy of the substrate fracture surfaces found evidence for the presence of amorphous, nonstoichiometric titanium oxides; no evidence of crystalline TiC or stoichiometric TiO[sub 2] was seen. Analysis of the XPS core level structure of the Ti and C spectra confirmed the presence of titanium carbide; little evidence of metallic titanium was seen in the interfacial region. Differences in the structure of the substrate fracture surface between titanium and the Ti alloy were also seen. The interface at the diamond/Ti-6Al-6V alloy was more heavily oxidized than the diamond/titanium interface. Depth profiling studies also revealed a thicker oxygen-containing surface layer on the alloy fracture surface.
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 5849231
- Journal Information:
- Journal of Applied Physics; (United States), Journal Name: Journal of Applied Physics; (United States) Vol. 74:12; ISSN JAPIAU; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
Similar Records
Microwave plasma assisted CVD of diamond on titanium and Ti-6Al-4V
Mechanical properties of titanium castings. [Ti-6Al-4V; Ti-6Al-6V-2Sn]
Related Subjects
360606* -- Other Materials-- Physical Properties-- (1992-)
ADHESION
ALLOYS
ALUMINIUM ALLOYS
CARBON
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
DEPOSITION
DIAMONDS
ELECTRON MICROSCOPY
ELECTRON SPECTROSCOPY
ELEMENTAL MINERALS
ELEMENTS
FILMS
INTERFACES
METALS
MICROSCOPY
MINERALS
NONMETALS
PHOTOELECTRON SPECTROSCOPY
RAMAN SPECTRA
SPECTRA
SPECTROSCOPY
SUBSTRATES
SURFACE COATING
THIN FILMS
TITANIUM
TITANIUM ALLOYS
TRANSITION ELEMENTS